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Sputter Coater

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Lab High Power Rotary Stage DC Magnetron PVD Vacuum Coating Machine

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Lab High Power Rotary Stage DC Magnetron PVD Vacuum Coating Machine

  • Model Number:

    OLT-SC-16-SM
  • Compliance:

    CE Certified
  • Minimum Order Quantity:

    1
  • Capacity:

    250 W
  • Voltage:

    108V-240V 50/60HZ
  • Power:

    1 year
  • Dimension(L*W*H):

    45
  • Packaging Details:

    Export wooden package
  • Delivery Time:

    6-8 day
  • Product Details

OLT-SC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cooling 2" target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Altarget is included for immediate use.

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Input Voltage 108V-220 VAC 50/60Hz 


110 V power is available by using a 1000 W transformer (15 A fuse). 

The transformer is sold separately.

Output Poer 1600 VDC
250 W
150 mA max.
Built-in over current protection (>150 mA)
Specimen Chamber Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
Please click here to order the Quartz Chamber replacement.

Sputtering Head  

& Specimen Stage

2“ flexible magnetron sputtering head with water cooling 

jacket is included (Fig.1)

One 50 mm Dia stainless steel sample stage is rotatable 

from 0 - 5 RPM

One manually operated shutter for target protection. (Fig.2)

Sputtering head holder is available for holding sputtering head while 

non-operation.

The distance between the sputtering head and sample stage is 

adjustable 

from 60 - 100 mm.

Max Coating area: 4" diameter max. 

One Air Cold Recirculating Water Chiller 10 L/min Flow for cooling 

sputtering head, 

the water chiller is optional . (Fig.6)

Control Panel

6" color  touch-screen control panel with PLC integration for 

easy operation

One panel for all parameters monitor and control: vacuum, current.

Ultimate Vacuum 

Pressure

Built-in KF25 vacuum port

The system requires an Ar gas tank with pressure 

regulator. (not included)

< 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, 

Mo targets (not sensitive to air)

< 1.0E-5 Torr by Turbomolecular pump (not included) for Al, Mg, 

Li, Lr, Ti, Zn targets (sensitive to air)

The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight

 and baking

Gas Atmosphere

One needle valve installed to allow Ar gas inlet to achieve better 

plasma coating

The system requires an Ar gas tank with pressure 

regulator (not included)

Target

One 2"  Copper target  is included for testing, 

Target size: 2" Dia.x 2.5mm.

It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every 

kind of metallic material.   

Warning : Aluminum ,Chromium or Nickel Target   can be coating by 

this machine, but please view the Recommend Coating Method before 

using.Please using RF Plasma Magnetron Sputtering for coating Alumina

Optional Film 

Thickness Monitor

Film thickness monitor is optional at extra cost

Heatable sample stage up to 500°C is available upon request 

at extra cost

Flowmeter for accurate control gas inlet  is available upon request at 

extra cost.

Overall Dimension L 440 mm×W 330 mm × H 290 mm
Net Weight 20 kg

Shipping Weight 

& Dimension

160 lbs
45" x 45" x 40"
Compliance CE approval

MET Certification (UL 1450) is available upon request at extra 

cost, please contact our sales representative for quote. 

Warranty One year limited with lifetime support
Application Notes

Warning: Sputtering head connects to HIGH voltage. The operator 

must wear gloves during operation

Make sure the target, sputtering head, substrate, and heating stage 

are clean before coating, need to use the sandpaper and alcohol to 

clean and fresh the Al or Nickel target each time using.

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Magnetron Sputtering.jpg

Experimental results

Magnetron-Sputtering.jpg

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