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Direct Injection Type Atmospheric Plasma Cleaning Machine

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Direct Injection Type Atmospheric Plasma Cleaning Machine

PL-01C RF Plasma System R&D plasma system for surface cleaning, surface activation and surface etching
  • Item NO.:

    PL-01C
  • Lead Time:

    7days
  • Shipping Port:

    XiaMen
  • Product Details



PL-01C RF Plasma System

R&D plasma system for surface cleaning, surface activation and surface etching





Product Introduction

Product Description
Based on modified CCP technique, PL-01C is a R&D-oriented desktop-type plasma cleaner especially designed for the research of bio-materials, nano materials, microfluidics and so on. Unlike traditional parallel-type plasma cleaner, our plasma source delivers stronger plasma density under similar process condition. Stronger plasma density contributes to effective surface treatment (i.e. cleaning/modification) and surface etching. Please contact us for more information.
Product Features
* Effective treatment – patented plasma delivers stronger plasma density, this enables effective surface cleaning, modification, etching and even ion implantation.
* Controllability - programed sequences (i.e. pumping, venting and process setup) with graphical illustrations for easy, intuitive operation.
* Traceability - system status is fully recorded for tracking and analysis. Alarm is provided to highlight abnormal situations for quick diagnosis and problem solving.
Product Application
* Bio-material researches
* Nano-material researches
* 2D material researches
* Microfluidics researches



Standard Specification
Size and weight
* Dimension: 700mm (L) x 580mm (W) x 560mm (H)
* Weight: approx. 40kg
* Front-opening design for easy loading / unloading substrates and hardware maintenance
Plasma generator
* Frequency: 13.56MHz
* Power rating: 300W
* Cooling: air-cooling
Plasma matching
* Automatic matching network
* Cooling: air-cooling
Plasma source
* Modified CCP-type plasma with 4” dia. effective treatment area
* Integrated with built-in gas inlet for O2 dosage via MFC
Gas flow control
* MFC for O2
* Max flow rate: 50 sccm
Pumping / gauge units
* Low vacuum range: 
  ○ Pump type: rotary vane pump 
  ○ Pumping capability: 250L/min, 50/60Hz 
  ○ Gauge type: Pirani 
  ○ Measuring range: 1x10E-4 ~ 1000 Torr\
Control interface
* 4” full-color touch-screen with preprogramed controlling sequences


Optional Items
Bias mode
* Via upper plasma plate
Gas ring
* Introduce MFC-regulated gas between plasma plates
MFC for gas ring
* Quantity: 1 ea
* Please specify gas species and required flow rate
Additional gas inlet for plasma source
* Introduce MFC-regulated gas from plasma source
MFC for additional plasma source gas inlet
* Quantity: 1 ea
* Please specify gas species and required flow rate
Precursor module
* Quantity: 1 ea, including precursor container, heater and temperature controller.
* This module will work with moving bench
Moving bench for precursor module
* Quantity: 1 ea
MFC for precursor module
* Quantity: 1 ea
* Please specify gas species and required flow rate

Facilities
Electricity
* AC220V, 15A, 50/60Hz
* Supplied with 2-meter long power cable. Please locate PL-01C near plug
Grounding
* Earth grounding resistance: <10 ohm
* Connection: Copper mesh or 8mm square wire
Gas for venting system
* Gas species: Nitrogen
* Pressure: 3~5kg/cm2
* Connection: 1/4” Swagelock x 1ea
Gas for plasma treatment
* Gas species: 5N O2
* Pressure: 2~3kg/cm2 , equivalent to 30psi
* Connection: 1/4” Swagelock x 1ea
Exhaust
* For rotary vane pump
  ○ Flow > 300L/min 
  ○ Connection: NW25 x 1ea
Cooling water
* Water flow: > 20L/min
* Water pressure: 2kg/cm2
* Water resistance: > 3 mega ohm
* Water PH value: 7~8
* Water temperature: 20~25ºC
* Water inlet connection: ¼” Swagelock x 1ea
* Water outlet connection: ¼” Swagelock x 1ea
General Environment Requests
* Clean room
* Room temperature: 20ºC +/- 3ºC
* Room moisture: 50% +/- 10%


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